LOW-K BANDS IN HF-176 POPULATED IN (ALPHA,2N) REACTION

被引：29

作者：

KHOO, TL ^{[1
]}

WADDINGTON, JC ^{[1
]}

PREIBISZ, Z ^{[1
]}

JOHNS, MW ^{[1
]}

机构：

[1] MCMASTER UNIV, TANDEM ACCELERATOR LAB, HAMILTON, ONTARIO, CANADA

来源：

NUCLEAR PHYSICS A | 1973年 / A202卷 / 02期

关键词：

D O I：

10.1016/0375-9474(73)90225-X

中图分类号：

O57 [原子核物理学、高能物理学];

学科分类号：

070202 ;

摘要：

引用

页码：289 / 320

页数：32

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