INTERFACE SEGREGATION AND CLUSTERING IN STRAINED-LAYER INGAAS/GAAS HETEROSTRUCTURES STUDIES BY CROSS-SECTIONAL SCANNING-TUNNELING-MICROSCOPY

被引:121
作者
ZHENG, JF
WALKER, JD
SALMERON, MB
WEBER, ER
机构
[1] LAWRENCE BERKELEY LAB,DIV MAT SCI,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
关键词
D O I
10.1103/PhysRevLett.72.2414
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Interface roughness due to segregation and clustering has been studied in atomic detail for the first time, using a cross-sectional scanning tunneling microscope and its spectroscopic ability to distinguish In and Ga atoms in GaAs/In0.2Ga0.8As/GaAs strained layers. In the In0.2Ga0.8As layers, InAs is found to cluster preferentially along the growth direction with each cluster containing 2-3 indium atoms. Indium segregation induced an asymmetrical interface broadening. The interface of GaAs as grown on In0.2Ga0.8As is found to be broadened to about 5-10 atomic layers, while that of InGaAs on GaAs is about 2-4 layers broad.
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页码:2414 / 2417
页数:4
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