TUNNELING MICROSCOPY OF 2H-MOS2 - A COMPOUND SEMICONDUCTOR SURFACE

被引:66
作者
WEIMER, M
KRAMAR, J
BAI, C
BALDESCHWIELER, JD
机构
来源
PHYSICAL REVIEW B | 1988年 / 37卷 / 08期
关键词
D O I
10.1103/PhysRevB.37.4292
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:4292 / 4295
页数:4
相关论文
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