NEW MODELS FOR THE POSITIVE AND NEGATIVE TEMPERATURE COEFFICIENTS OF RESISTIVITY FOR TIO0.80-1.23 METALLIC OXIDES

被引：24

作者：

MCLACHLAN, DS ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

PHYSICAL REVIEW B | 1982年 / 25卷 / 04期

关键词：

D O I：

10.1103/PhysRevB.25.2285

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2285 / 2296

页数：12

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