TANTALUM COATING OF MILD-STEEL BY CHEMICAL VAPOR-DEPOSITION

被引：11

作者：

BEGUIN, C ^{[1
]}

HORVATH, E ^{[1
]}

PERRY, AJ ^{[1
]}

机构：

[1] BERNA AG OLTEN,DIV BERNEX,CH-4600 OLTEN,SWITZERLAND

来源：

关键词：

D O I：

10.1016/0040-6090(77)90064-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：209 / 212

页数：4

共 8 条

[1] BROSSA F, 1967, GALVANOTECH OBERFLAC, V8, P238
[2] BRYANT WA, 1975, 5TH P INT C CHEM VAP, P161
[3] THE VAPOR-PHASE DEPOSITION OF REFRACTORY MATERIALS .1. GENERAL CONDITIONS AND APPARATUS
CAMPBELL, IE
POWELL, CF
NOWICKI, DH
GONSER, BW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1949, 96 (05) : 318 - 333
[4] GLASK FA, 1973, 4TH P INT CVD C, P521
[5] HIEBER K, 1975, 5TH P INT C CVD PRIN, P436
[6] THE DEPOSITION OF TANTALUM AND COLUMBIUM FROM THEIR VOLATILIZED HALIDES
POWELL, CF
CAMPBELL, IE
GONSER, BW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1948, 93 (06) : 258 - 265
[7] SCHROFF AM, 1974, HIGH TEMP HIGH PRESS, V6, P415
[8] SPITZ J, 1975, 5TH P INT C CVD ECS, P204