SIMULTANEOUS COMPENSATION OF 2ND-ORDER PARASITIC ABERRATIONS IN BOTH PRINCIPAL SECTIONS OF AN ACHROMATIC QUADRUPOLE LENS DOUBLET

被引：22

作者：

MARTIN, FW ^{[1
]}

GOLOSKIE, R ^{[1
]}

机构：

[1] WORCESTER POLYTECH INST,DEPT PHYS,WORCESTER,MA 01609

来源：

关键词：

D O I：

10.1016/0168-583X(88)90004-3

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：242 / 247

页数：6

共 20 条

[1]

BECK V, 1976, 34TH P ANN M EL MICR, P578

[2]

BECK VD, 1979, OPTIK, V53, P241

[3] PROTON MICROBEAMS, THEIR PRODUCTION AND USE [J].

COOKSON, JA ;

FERGUSON, AT ;

PILLING, FD .

JOURNAL OF RADIOANALYTICAL CHEMISTRY, 1972, 12 (01) :39-52

[4]

CREWE AV, 1980, OPTIK, V55, P1

DOYLE, BL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :1374-1379

[6]

GRIME GW, 1984, BEAM OPTICS QUADRUPO, P103

[7]

HAWKES PW, 1970, QUADRUPOLES ELECTRON, P88

[8]

JAMIESON DN, UNPUB NUCL INSTR M B

[9]

KELMAN VM, 1962, SOV PHYS-TECH PHYS, V6, P1052

[10]

KOOPS H, 1977, OPTIK, V48, P225