TEMPERATURE-VARIATION OF THE ABSORPTION-EDGE OF CVD AMORPHOUS AND POLYCRYSTALLINE SILICON

被引：15

作者：

JANAI, M

KARLSSON, B

机构：

[1] Optical Sciences Center, University of Arizona, Tucson

来源：

SOLAR ENERGY MATERIALS | 1979年 / 1卷 / 5-6期

关键词：

D O I：

10.1016/0165-1633(79)90006-6

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Amorphous silicon films were prepared by the pyrolytic decomposition of silane (CVD). Their optical reflectance and transmittance in the near-infrared and in the visible regions werem measured at temperatures between -25 and 500°C. Optical absorption profiles and refractive indices of the films were calculated, and the thermal red shift of the absorption profile was determined. These measurements were repeated following crystallization of the silicon films. The significance of the results for thermal conversion of solar energy with CVD silicon as the absorbing material is discussed. © 1979.

引用

页码：387 / 395

页数：9

共 15 条

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[2]

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[3]

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[4]

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[8]

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[9]

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[10]

Jacobson, Lamoreaux, Shimshock, Raouf, Seraphin, Proc. Soc. Photo-Optical Instrumentation Engineers, Optics Applied to Solar Energy, 161-164, (1978)

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