LASER CLEANING REMOVES PARTICLES FROM SURFACES

被引:50
作者
ZAPKA, W
ZIEMLICH, W
LEUNG, WP
TAM, AC
机构
[1] IBM ADSTAR,SAN JOSE,CA 95193
[2] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120
关键词
MICRODEVICES; MICROCONTAMINATION; PARTICULATE CONTAMINATION; LASER CLEANING; LASER-INDUCED PARTICLE REMOVAL; EXPLOSIVE EVAPORATION;
D O I
10.1016/0167-9317(93)90214-P
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Laser-induced removal of particles from surfaces was demonstrated. Such ''laser cleaning'' can be performed on the bare contaminated surface or with additional micron-thickness liquid film coverage on the surface. With the latter ''steam laser cleaning'' we achieved removal of epoxy, alumina, silicon, and gold particles of size 0.1 mum to 10 mum from silicon surfaces. The proposed mechanism of particle ejection is described.
引用
收藏
页码:171 / 183
页数:13
相关论文
共 13 条
[1]  
Ohmi, Microelectron. Eng., 10, (1991)
[2]  
Iscoff, Semicond. Int., (1991)
[3]  
Hoenig, Particles on Surfaces, 1, (1988)
[4]  
Zapka, Ziemlich, Tam, Appl. Phys. Lett., 58, (1991)
[5]  
Tam, Leung, Zapka, Ziemlich, J. Appl. Phys., 71, (1992)
[6]  
Mittal, Particles on Surfaces, 1, (1988)
[7]  
Mittal, Particles on Surfaces, 2, (1989)
[8]  
Kelley, Stuff, Hovis, Linford, SPIE Proc., 1415, (1991)
[9]  
Imen, Lee, Allen, Appl. Phys. Lett., 58, (1991)
[10]  
Zapka, Sonchik, Behringer, Haug, Meissner, Silverman, Ziemlich, Bohlen, Smith, Mix-and-match EBP/optical lithography of 1 Mbit chips, Microelectronic Engineering, 13, (1991)