OXIDATION PROTECTIVE BARRIER COATINGS FOR HIGH-TEMPERATURE POLYMER MATRIX COMPOSITES

被引:15
作者
HARDING, DR
SUTTER, JK
SCHUERMAN, MA
CRANE, EA
机构
[1] XAVIER UNIV,CINCINNATI,OH 45207
[2] JOHN CARROLL UNIV,CLEVELAND,OH 44118
关键词
D O I
10.1557/JMR.1994.1583
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Three coating techniques (metal-organic chemical vapor deposition, magnetron sputtering, and plasma-enhanced chemical vapor deposition) were employed to deposit different coating materials (alumina, a superalloy, and silicon nitride) on graphite-fiber-reinforced polyimide composites to protect against oxidation at elevated temperatures. Adhesion and integrity of the coatings were evaluated by isothermal aging (371-degrees-C for 500 h) and thermal cycling (25 to 232-degrees-C for 1000 cycles and -18 to 232-degrees-C for 300 cycles). Best results were achieved with a plasma-deposited, amorphous silicon nitride (a-SiN: H) coating, which withstood stresses from 0.18 to -1.6 GPa. The major factors affecting the suitability of a-SiN: H as an oxidation protective coating are the surface finish of the polymer composite and the presence of a sizable hydrogen content in the coating.
引用
收藏
页码:1583 / 1595
页数:13
相关论文
共 35 条
[2]  
ARNOLD S, 1990, NASA103204 TECHN MEM
[3]   STUDIES OF STRESS RELATED ISSUES IN MICROWAVE CVD DIAMOND ON (100) SILICON SUBSTRATES [J].
BAGLIO, JA ;
FARNSWORTH, BC ;
HANKIN, S ;
HAMILL, G ;
ONEIL, D .
THIN SOLID FILMS, 1992, 212 (1-2) :180-185
[4]  
BARDNES CR, 1960, J ELECTROCHEM SOC, V107, P98
[5]  
BOWLES KJ, 1986, NASA87204 TECHN MEM
[6]   EVALUATION OF INTERNAL-STRESSES PRESENT IN CHEMICAL VAPOR-DEPOSITION DIAMOND FILMS [J].
CHALKER, PR ;
JONES, AM ;
JOHNSTON, C ;
BUCKLEYGOLDER, IM .
SURFACE & COATINGS TECHNOLOGY, 1991, 47 (1-3) :365-374
[7]   SPUTTERING ON POLYMERIC COMPOSITES [J].
CHAMBERS, DL ;
TAYLOR, KA ;
WAN, CT ;
EMRICK, AJ .
SURFACE & COATINGS TECHNOLOGY, 1990, 41 (03) :315-323
[8]   HYDROGEN CONTENT OF A VARIETY OF PLASMA-DEPOSITED SILICON NITRIDES [J].
CHOW, R ;
LANFORD, WA ;
WANG, KM ;
ROSLER, RS .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (08) :5630-5633
[9]  
ELMES DA, 1988, 3RD PLAS RUBB I INT, V35
[10]   STRAIN IN CVD DIAMOND FILMS - EFFECTS OF DEPOSITION VARIABLES [J].
GUO, H ;
ALAM, M .
THIN SOLID FILMS, 1992, 212 (1-2) :173-179