APPLICATION OF SILICON POLYMER AS POSITIVE PHOTOSENSITIVE MATERIAL

被引:8
作者
AOAI, T
UMEHARA, A
KAMIYA, A
MATSUDA, N
AOTANI, Y
机构
关键词
D O I
10.1002/pen.760291312
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:887 / 890
页数:4
相关论文
共 18 条
[1]  
AOAI T, 1983, Patent No. 121446
[2]  
AOAI T, 1983, Patent No. 37549
[3]  
AOAI T, 1984, Patent No. 141442
[4]   PHOTOLYSIS OF MACROMOLECULAR ORTHO-NITROBENZYL DERIVATES [J].
BARZYNSKI, H ;
SANGER, D .
ANGEWANDTE MAKROMOLEKULARE CHEMIE, 1981, 93 (FEB) :131-141
[5]  
BARZYNSKI H, 1971, Patent No. 2150691
[6]  
BUHR G, 1979, Patent No. 2928636
[7]   PROTECTION OF HYDROXYL GROUPS AS TERT-BUTYLDIMETHYLSILYL DERIVATIVES [J].
COREY, EJ ;
VENKATESWARLU, A .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1972, 94 (17) :6190-+
[8]  
DUPONT FJ, 1987, J IMAGING SCI, V31, P11
[9]   POLY[PARA-(FORMYLOXY)STYRENE] - SYNTHESIS AND RADIATION-INDUCED DECARBONYLATION [J].
FRECHET, JMJ ;
TESSIER, TG ;
WILLSON, CG ;
ITO, H .
MACROMOLECULES, 1985, 18 (03) :317-321
[10]  
FRECHET JMJ, 1986, J IMAGING SCI, V30, P59