SYNCHROTRON RADIATION AND LOW-ENERGY ELECTRON-DIFFRACTION STUDIES OFULTRATHIN C-60 FILMS DEPOSITED ON CU(100), CU(111) AND CU(110)

被引:87
作者
ROWE, JE
RUDOLF, P
TJENG, LH
MALIC, RA
MEIGS, G
CHEN, CT
CHEN, J
PLUMMER, EW
机构
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 1992年 / 6卷 / 23-24期
关键词
D O I
10.1142/S0217979292001997
中图分类号
O59 [应用物理学];
学科分类号
摘要
High resolution K-edge photoemission and X-ray absorption spectroscopies have been used to study the chemical properties of the interface formed with C60 and Cu. We find that for very thin (0.24 - 1 monolayers) C60 films, deposited in ultrahigh vacuum, the Cu substrate plays a role similar to that of K in K3C60 films. Thus Cu donates charge to partially fill the pi* LUMO band, and the C (1s) core level shifts due to charge transfer. For monolayer coverage the C (1s) core-level line shape is broad. Low energy electron diffraction studies of C60 on Cu(100), Cu(111) and Cu(110) show that well ordered overlayers of thickness > 2 monolayers can be formed on all three Cu surfaces, but single-domain epitaxy is achieved only on Cu(111). The substrate temperature during C60 deposition is critical for the ordering of the film.
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页码:3909 / 3913
页数:5
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