STRUCTURING MAGNETIC THIN-FILMS BY MEANS OF PLASMA-ETCHING

被引：22

作者：

VANDELFT, FCMJM

机构：

[1] Philips Research Laboratories, 5656 AA Eindhoven

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 140卷

关键词：

D O I：

10.1016/0304-8853(94)00574-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Plasma etching of magnetic thin films is much more difficult than etching of silicon. A mechanistic framework has been constructed, which can explain why plasma etching of magnetic materials is, in many cases, restricted to low etch rates and oblique profiles.

引用

页码：2203 / 2204

页数：2

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