ABINITIO MOLECULAR-DYNAMICS STUDY OF DEFECTS ON THE RECONSTRUCTED SI(001) SURFACE

被引:46
作者
IHARA, S [1 ]
HO, SL [1 ]
UDA, T [1 ]
HIRAO, M [1 ]
机构
[1] HITACHI LTD,ADV RES LAB,HATOYAMA,SAITAMA 35003,JAPAN
关键词
D O I
10.1103/PhysRevLett.65.1909
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present a new defect model for the reconstructed Si(001) surface. Ab initio molecular-dynamics simulations at finite temperature show the existence of interstitial dimers which are recessed from the surface. These dimers and adjacent on-surface dimers are both symmetric. The possibility that missing dimer vacancies observed by scanning tunneling microscopy contain these new surface defects is pointed out. © 1990 The American Physical Society.
引用
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页码:1909 / 1912
页数:4
相关论文
共 36 条
[1]  
ABRAHAM FF, 1985, SURF SCI, V163, pL752, DOI 10.1016/0039-6028(85)91055-6
[2]   THEORY OF RECONSTRUCTION INDUCED SUBSURFACE STRAIN - APPLICATION TO SI(100) [J].
APPELBAUM, JA ;
HAMANN, DR .
SURFACE SCIENCE, 1978, 74 (01) :21-33
[3]   UNIFIED APPROACH FOR MOLECULAR-DYNAMICS AND DENSITY-FUNCTIONAL THEORY [J].
CAR, R ;
PARRINELLO, M .
PHYSICAL REVIEW LETTERS, 1985, 55 (22) :2471-2474
[4]   DIFFRACTION OF HE AT THE RECONSTRUCTED SI(100) SURFACE [J].
CARDILLO, MJ ;
BECKER, GE .
PHYSICAL REVIEW B, 1980, 21 (04) :1497-1510
[5]   GROUND-STATE OF THE ELECTRON-GAS BY A STOCHASTIC METHOD [J].
CEPERLEY, DM ;
ALDER, BJ .
PHYSICAL REVIEW LETTERS, 1980, 45 (07) :566-569
[6]   SI(100) SURFACES - ATOMIC AND ELECTRONIC-STRUCTURES [J].
CHADI, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1290-1296
[7]   ATOMIC AND ELECTRONIC-STRUCTURES OF RECONSTRUCTED SI(100) SURFACES [J].
CHADI, DJ .
PHYSICAL REVIEW LETTERS, 1979, 43 (01) :43-47
[8]   ELECTRONIC EXCITATIONS ON SI(100)(2X1) [J].
FARRELL, HH ;
STUCKI, F ;
ANDERSON, J ;
FRANKEL, DJ ;
LAPEYRE, GJ ;
LEVINSON, M .
PHYSICAL REVIEW B, 1984, 30 (02) :721-725
[9]  
FARRELL HH, 1985, 17TH P INT C PHYS SE, P63
[10]   NORM-CONSERVING PSEUDOPOTENTIALS [J].
HAMANN, DR ;
SCHLUTER, M ;
CHIANG, C .
PHYSICAL REVIEW LETTERS, 1979, 43 (20) :1494-1497