CORRELATION OF SPUTTERING CONDITIONS WITH ELECTRONIC CONDUCTION IN TA2O5 FILMS

被引：13

作者：

YOUNG, PL ^{[1
]}

FEHLNER, FP ^{[1
]}

WHITMAN, AJ ^{[1
]}

机构：

[1] CORNING GLASS WORKS,RES & DEV LAB,CORNING,NY 14830

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569115

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：174 / 176

页数：3

共 18 条

[1] [Anonymous], COMMUNICATION
[2] Berry R.W., 1968, THIN FILM TECHNOLOGY
[3] CLARK RS, 1965, IEEE T PARTS MATER P, V1, P31
[4] GERSTENBERG D, 1967, 17TH P EL COMP C, P77
[5] INGREY SI, 1976, THIN SOLID FILMS, V30, P377
[6] Kumagai H. Y., 1973, 23rd Electronic Components Conference, P257
[7] PITTETTI RC, 1971, 21ST P EL COMP C WAS, P195
[8] PRATT IH, 1971, 23RD EL COMP C WASH
[9] PULFREY DL, 1971, AFALTR70328 TECHN RE
[10] POOLE-FRENKEL EFFECT AND SCHOTTKY EFFECT IN METAL-INSULATOR-METAL SYSTEMS
SIMMONS, JG
[J]. PHYSICAL REVIEW, 1967, 155 (03): : 657 - &