FAST RECOVERY OF EXCITONIC ABSORPTION BLEACHING IN TUNNELING BIQUANTUM WELL STRUCTURES

被引：27

作者：

TACKEUCHI, A

MUTO, S

INATA, T

FUJII, T

机构：

[1] Fujitsu Laboratories, Ltd., Atsugi 243-01

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 15期

关键词：

D O I：

10.1063/1.105106

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This letter demonstrates the fast recovery from excitonic absorption bleaching in tunneling biquantum well structures. A tunneling biquantum well consists of a series of narrow and wide wells. Recovery time was reduced to 1 ps using 1.7-nm-thick tunneling barriers, three orders of magnitude shorter than the few nanoseconds recovery due to radiative recombination. This is the fastest tunneling process observed to date.

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页码：1670 / 1672

页数：3

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