ION-BEAM MIXING OF ERBIUM INTO POTASSIUM TITANYL PHOSPHATE BY MEGA-ELECTRON-VOLT ARGON BEAMS

A 500 Å erbium (Er) film was deposited on potassium titanyl phosphate (KTiOPO4 or KTP) by electron-beam evaporation. The doping of Er into KTP was induced by mega-electron-volt Ar+ with different doses. The doping amount was investigated by Rutherford backscattering of 3.0 MeV He +. The results show that the doping concentrations of Er in KTP were 2.88 and 1.88 at. % induced by 2.0 and 3.0 MeV Ar+ with the dose of 2×1016 ions/cm2 at room temperature, respectively. Perhaps the present result can provide an important approach not only for the laser and waveguide laser fabrication, but also for the high-concentration dopants (atomic percent levels) into KTiOPO4 at room temperature. © 1995 American Institute of Physics.