RESPONSE OF PHOTOGRAPHIC MATERIALS TO ELECTRONS WITH PARTICULAR REFERENCE TO ELECTRON MICROGRAPHY

被引:16
作者
FARNELL, GC [1 ]
FLINT, RB [1 ]
机构
[1] KODAK LTD,RES LABS,HARROW HA1 4TY,MIDDLESEX,ENGLAND
来源
JOURNAL OF MICROSCOPY-OXFORD | 1973年 / 97卷 / APR期
关键词
D O I
10.1111/j.1365-2818.1973.tb03782.x
中图分类号
TH742 [显微镜];
学科分类号
摘要
引用
收藏
页码:271 / 291
页数:21
相关论文
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