DETERMINATION OF DISPERSION-RELATION IN TUNNEL STRUCTURES - INFLUENCE OF BARRIER SHAPE AND VALIDITY OF WKB APPROXIMATION

被引：2

作者：

GUNDLACH, KH

KADLEC, J

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598

[2] MAX PLANCK INST PHYS & ASTROPHYS,MUNICH 40,WEST GERMANY

来源：

SOLID-STATE ELECTRONICS | 1973年 / 16卷 / 07期

关键词：

D O I：

10.1016/0038-1101(73)90175-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：787 / 792

页数：6

共 26 条

[1] PHOTOEMISSIVE DETERMINATION OF BARRIER SHAPE IN TUNNEL JUNCTIONS [J].

BRAUNSTE.A ;

BRAUNSTE.M ;

PICUS, GS ;

MEAD, CA .

PHYSICAL REVIEW LETTERS, 1965, 14 (07) :219-&

[2] VOLTAGE DEPENDENCE OF BARRIER HEIGHTS IN AL203 TUNNEL JUNCTIONS - (PHOTOEMISSION - ROOM TEMP TO 77DEGREES K - METAL-OXIDE-METAL JUNCTIONS - E/T) [J].

BRAUNSTEIN, AI ;

BRAUNSTEIN, M ;

PICUS, GS .

APPLIED PHYSICS LETTERS, 1966, 8 (04) :95-+

[3] TUNNEL EFFECT IN AL-AL2O3-AL JUNCTIONS - INCLUSION OF SHORT-RANGE FORCES [J].

DUBEY, PK .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (06) :2534-&

[4]

Duke C. B., 1969, TUNNELING SOLIDS

[5]

FRANZ W, 1956, HDB PHYSIK, V17

[6] LOGARITHMIC CONDUCTIVITY OF AL-AL2O3-AL TUNNELING JUNCTIONS PRODUCED BY PLASMA-OXIDATION AND BY THERMAL OXIDATION [J].

GUNDLACH, KH ;

HOLZL, J .

SURFACE SCIENCE, 1971, 27 (01) :125-&

[7] RANGE OF VALIDITY OF WKB TUNNEL PROBABILTY, AND COMPARISON OF EXPERIMENTAL DATA AND THEORY [J].

GUNDLACH, KH ;

SIMMONS, JG .

THIN SOLID FILMS, 1969, 4 (01) :61-&

[8] ZUR BERECHNUNG DES TUNNELSTROMS DURCH EINE TRAPEZFORMIGE POTENTIALSTUFE [J].

GUNDLACH, KH .

SOLID-STATE ELECTRONICS, 1966, 9 (10) :949-&

[9] ON POTENTIAL BARRIER SHAPE IN AL-AL2O3-AL TUNNEL JUNCTIONS [J].

GUNDLACH, KH .

SOLID-STATE ELECTRONICS, 1969, 12 (01) :13-&

[10] PHOTOEMISSIVE DETERMINATION OF BARRIER PROFILE IN AL-AL2O3-AL TUNNEL JUNCTIONS [J].

KORNEFFEL, B ;

LUDWIG, W .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1971, 8 (01) :149-+

← 1 2 3 →