SELF-DIFFUSION IN COPPER AT LOW-TEMPERATURES

被引：20

作者：

LAM, NQ ^{[1
]}

ROTHMAN, SJ ^{[1
]}

NOWICKI, LJ ^{[1
]}

机构：

[1] ARGONNE NATL LAB,MAT SCI DIV,ARGONNE,IL 60439

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1974年 / 23卷 / 01期

关键词：

D O I：

10.1002/pssa.2210230148

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：K35 / K38

页数：4

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