USE OF A REFRACTOR PLATE FOR AUTOMATIC BACKGROUND CORRECTION IN ELECTROTHERMAL VAPORIZATION INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION-SPECTROMETRY

被引:13
作者
VERREPT, P
VANDECASTEELE, C
WINDELS, G
DAMS, R
机构
[1] Laboratory of Analytical Chemistry, Institute for Nuclear Sciences, University of Gent, B-9000 Gent
关键词
D O I
10.1016/0584-8547(91)80010-Z
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
[No abstract available]
引用
收藏
页码:99 / 102
页数:4
相关论文
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