MOSSBAUER INVESTIGATION OF SPUTTERED FERROMAGNETIC AMORPHOUS FEXB100-X FILMS

被引：23

作者：

BLUM, NA

MOORJANI, K

POEHLER, TO

SATKIEWICZ, FG

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 03期

关键词：

D O I：

10.1063/1.330749

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2074 / 2076

页数：3

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