THE ELECTRONIC-STRUCTURE OF THE GERMYL ANION GEH3- - A COMPARISON WITH OTHER AH3- SPECIES

被引:57
作者
EADES, RA
DIXON, DA
机构
[1] Department of Chemistry, University of Minnesota, Minneapolis
关键词
D O I
10.1063/1.439568
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electronic structure of the germyl anion, GeH3-, has been investigated by ab initio SCF calculations using large Gaussian basis sets. Various levels of basis set contraction for Ge are discussed. The optimum geometry of the ion is found to be C3V with r(Ge-H)=1.61 Å and θ(H-Ge-H)=95.9°. The barrier to inversion for GeH3 - is 30.0 kcal/mole obtained with a (16, 13, 7/6, 1)/[12, 10, 4/4, 1] basis set. The inversion barrier in SiH3- was also studied and was found to be 26.0 kcal/mole. Vertical electron affinities for GeH3 and SiH3 have been determined from the negative ion, wave functions using Koopmans' theorem. The values are 1.94 eV for GeH 3 and 1.65 eV for SiH3. A comparison with the experimental photodetachment results is also presented. © 1980 American Institute of Physics.
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页码:3309 / 3313
页数:5
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