NEW AMORPHOUS TITANIUM OXYSULFIDES OBTAINED IN THE FORM OF THIN-FILMS

Thin films of amorphous titanium oxysulfides have been obtained by radiofrequency sputtering using a TiS2 target containing a small amount of oxygen. Analyses and characterization of thin films using Rutherford backscattering (RBS), Auger electron spectroscopy (AES), secondary-ion mass spectrometry (SIMS) and X-ray microprobe have been performed. The slightly hydrolyzed surface of the target materials leads to oxygen-rich thin films at the beginning of the sputtering and to the TiO0.3S1.5 composition after 6 h of sputtering. The sputtering yield and deposition rate have been calculated. The density determined by X-ray absorption (2.0 +/- 0.1 g cm-3) is much lower than that of crystallized TiO2 and TiS2. These new amorphous materials can be used as positive electrode materials in microbatteries.