FORMATION OF A TERNARY SILICIDE FOR NI/TI/SI (100) AND NI/TISI2 STRUCTURES

被引:18
作者
SETTON, M
VANDERSPIEGEL, J
ROTHMAN, B
机构
[1] ECOLE NATL SUPER PHYS GRENOBLE,MAT & GENIE PHYS LAB,CNRS,UA 1109,ST MARTIN DHERES,FRANCE
[2] UNIV PENN,DEPT ELECT ENGN,PHILADELPHIA,PA 19104
关键词
D O I
10.1557/JMR.1989.1218
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1218 / 1226
页数:9
相关论文
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