CLEANING THE SURFACE OF SRTIO3(100) AND LAALO3(100) UNDER MODERATE TEMPERATURE CONDITION BY BI ADSORPTION DESORPTION TREATMENT

被引：29

作者：

WATANABE, S

HIKITA, T

KAWAI, M

机构：

[1] Researc Laboratory ofEngineering Materials, Tokyo Institute of Technology, Midori-ku, Yokohama 227

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 04期

关键词：

D O I：

10.1116/1.577283

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

[No abstract available]

引用

收藏

页码：2394 / 2396

页数：3

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