STRUCTURE OF MGO FILMS ON NACL-TYPE ALKALI-HALIDES

MgO films were deposited on LiF, NaCl and KCl at 25-300°C in residual gas pressures of 10-5 and 10-7 Torr and in oxygen at 10-4-10-5 Torr. The film's structure was examined by reflection high energy electron diffraction. The impurities in the films were determined by infrared spectroscopy. Results showed that MgO initially formed three-dimensional islands in parallel orientation. The deposition temperature at which parallel orientation occurred depended on the nature of the substrate. The mode of MgO growth and the parallel orientation were not influenced by the pressure of residual gases or by the presence of oxygen. The parallel orientation persisted up to a film thickness that was influenced by the nature of the substrate and also by the incorporation of defects and impurities into the growing films. © 1979.