Use of Electron Microprobe Analysis to Determine Layer Thicknesses down to the Monolayer Range

被引：16

作者：

Butz, R. ^{[1
]}

Wagner, H. ^{[1
]}

机构：

[1] Kernforschungsanlage Julich, Inst Tech Phys, Hannover, Germany

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1970年 / 3卷 / 02期

关键词：

D O I：

10.1002/pssa.19700030206

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Electron microprobe analysis has been performed on Mo layers of 2 to 157 angstrom thickness depositedon tungsten. The X-ray intensity of the Mo-L-alpha 1 and W-M-alpha 1 line were investigated as a function of the Mo layer thickness and the electron beam voltage of 2.9 to 40 kV. Mo layers could be detected down to the monolayer range. A linear relation between the layer thickness and the X-ray intensity is found. The greatest sensitivity in the determination of the layer thickness is attained for beam voltages 3 to 4 times the excitation energy of the characteristic Mo radiation.

引用

页码：325 / 331

页数：7