INFLUENCE OF FLUORIDE IONS ON THE PASSIVE DISSOLUTION OF TITANIUM

被引:80
作者
KELLY, JJ
机构
[1] Philips Research Laboratories, Eindhoven
关键词
D O I
10.1016/0013-4686(79)87084-X
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Steady state, potential step and impedance measurements were used to investigate the influence of fluoride ions on the passive dissolution of Ti in 4.5 M H2SO4 solution. The results indicated that metal dissolution occurs via a surface film, the presence of which was confirmed by a SEM study. Electron diffraction and SIMS measurements have shown this film to be polycrystalline TiO2. A mechanism involving simultaneous formation and dissolution of surface oxide is suggested to explain the results. The ionic current through the film is field-dependent. The dissolution rate of the oxide is determined mainly by the fluoride concentration of the solution. © 1979.
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页码:1273 / 1282
页数:10
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