AREA DENSITY CONTROL OF QUANTUM-SIZE INGAAS/GA(A1)AS DOTS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

被引:35
作者
OSHINOWO, J
NISHIOKA, M
ISHIDA, S
ARAKAWA, Y
机构
[1] Institute of Industrial Science, University of Tokyo, Minato-ku, Tokyo, 106
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 11B期
关键词
QUANTUM DOTS; INGAS; MOCVD; STRANSKI-KRASTANOW GROWTH MODE; STRAINED NANOSTRUCTURES; SUBSTRATE OFF-ANGLE ORIENTATION;
D O I
10.1143/JJAP.33.L1634
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the accumulation of InGaAs dots (approximately 15 nm) on GaAs and AlGaAs surfaces, by metalorganic chemical vapor deposition (MOCVD). Scanning electron micrography (SEM) shows highly uniform dots formed by the Stranski-Krastanow growth mode. The average area InGaAs dot density can be controlled from 10(8) cm-2 up to more than 10(11) cm-2 by substrate off-angle orientation, deposition thickness, and growth temperature. The results indicate high area dot density for low surface diffusion.
引用
收藏
页码:L1634 / L1637
页数:4
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