ELECTRON BEAM EXPOSURE SYSTEM FOR INTEGRATED CIRCUITS

This is a report on a versatile electron beam exposure system which makes it possible to expose photo-resist for a pattern of integrated circuits without using a photo-mask. Pattern generation and registration is automatically conducted by an electronic computer. The pattern scanning is conducted in such a way that the beam is moved only in the area to be exposed. Accurate registration is provided by utilizing the reflected electron. A modification of the system to improve the accuracy of the mechanical movement is also described. With this system, a minimum exposed line width of 0·7 μ and a registration accuracy of ±1 μ are obtainable. © 1969.