MECHANISM OF THE Y/SI INTERFACE FORMATION STUDIED BY PHOTOEMISSION

被引：23

作者：

PELLISSIER, A ^{[1
]}

BAPTIST, R ^{[1
]}

CHAUVET, G ^{[1
]}

机构：

[1] CEN,PSC,DEPT RECH FONDAMENTALE,SERV PHYS,F-38041 GRENOBLE,FRANCE

来源：

SURFACE SCIENCE | 1989年 / 210卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(89)90105-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：99 / 113

页数：15

共 44 条

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