PHOTOCHEMICAL FORMATION OF OLIGOTHIOPHENE CATION RADICALS IN ACIDIC SOLUTION AND NAFION

被引：103

作者：

ZINGER, B ^{[1
]}

MANN, KR ^{[1
]}

HILL, MG ^{[1
]}

MILLER, LL ^{[1
]}

机构：

[1] UNIV MINNESOTA,DEPT CHEM,MINNEAPOLIS,MN 55455

来源：

CHEMISTRY OF MATERIALS | 1992年 / 4卷 / 05期

关键词：

D O I：

10.1021/cm00023a033

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Three alpha-coupled terthiophenes, substituted on the terminal positions with methyl, thiomethyl, or bromo substituents, were photooxidized in a solvent mixture of methylene chloride and trifluoroacetic acid to form cation radicals. Visible, near-IR, and ESR spectra are reported. It is shown that the photooxidation requires oxygen and is acid catalyzed. In acetonitrile/trifluoroacetic acid, cation radical pi-dimers are formed. Using Nafion, stable films of the cation radical dimer or dication of 2,5"-bis(thiomethyl)terthiophene could be formed.

引用

页码：1113 / 1118

页数：6

共 38 条

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