EFFECTS OF INERT-GAS DILUTION OF SILANE ON PLASMA-DEPOSITED A-SI-H FILMS

被引:154
作者
KNIGHTS, JC [1 ]
LUJAN, RA [1 ]
ROSENBLUM, MP [1 ]
STREET, RA [1 ]
BIEGLESEN, DK [1 ]
REIMER, JA [1 ]
机构
[1] CALTECH,DIV CHEM & CHEM ENGN,PASADENA,CA 91125
关键词
D O I
10.1063/1.92359
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:331 / 333
页数:3
相关论文
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