X-RAY FORM-FACTORS AND COMPTON PROFILE IN CRYSTALLINE ALUMINUM

被引：21

作者：

TAWIL, RA ^{[1
]}

机构：

[1] BATTELLE MEM INST,COLUMBUS LABS,COLUMBUS,OH 43201

来源：

PHYSICAL REVIEW B | 1975年 / 11卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.11.4891

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：4891 / 4897

页数：7

共 35 条

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