DEFECT DIFFUSION IN ION-IMPLANTED GLASSES

被引：24

作者：

ARNOLD, GW

BATTAGLIN, G

BOSCOLOBOSCOLETTO, A

CACCAVALE, F

DEMARCHI, G

MAZZOLDI, P

MIOTELLO, A

机构：

[1] UNIV PADUA,DIPARTIMENTO FIS,CONSORZIO INFM,I-35100 PADUA,ITALY

[2] UNIV VENICE,DIPARTIMENTO CHIM FIS,CONSORZIO INFM,VENICE,ITALY

[3] CTR RIC MONTEDIPE,VENICE,ITALY

[4] UNIV TRENTO,DIPARTIMENTO FIS,CONSORZIO INFM,I-38050 TRENT,ITALY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1992年 / 65卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(92)95072-Y

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Ion implantation in glasses produces structure modifications at depths greater than those of the implanted ion range. Such a result is evidenced by means of leaching experiments, alkali element depletion, distribution of gaseous implanted species, etching rate as function of depth. A systematic study with the aim to evidence a threshold in the nuclear deposited energy for defect diffusion is presented. Fourier transform infrared spectroscopy measurements confirm the glass modifications at extended depths.

引用

页码：387 / 391

页数：5

共 20 条

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