MICROTOPOGRAPHY OF OXIDE FILMS FORMED ON TANTALUM

被引：15

作者：

PAWEL, RE

CATHCART, JV

CAMPBELL, JJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1960年 / 107卷 / 12期

关键词：

D O I：

10.1149/1.2427578

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：956 / 960

页数：5

相关论文

共 5 条

[1] SOME OBSERVATIONS ON THE EFFECT OF THE INTERACTION OF TANTALUM WITH OXYGEN, NITROGEN, AND HYDROGEN [J].

BAKISH, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (10) :574-577

[2] METALLOGRAPHIC MANIFESTATIONS OF THE AIR OXIDATION OF TANTALUM AT 750-DEGREES-C [J].

BAKISH, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (02) :71-74

[3] OXIDATION PROPERTIES OF TANTALUM BETWEEN 400-DEGREES-C AND 530-DEGREES-C [J].

CATHCART, JV ;

BAKISH, R ;

NORTON, DR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (08) :668-670

[4] THE MICROTOPOGRAPHY OF OXIDE FILMS ON NIOBIUM [J].

CATHCART, JV ;

CAMPBELL, JJ ;

SMITH, GP .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (08) :442-446

[5]

CATHCART JV, UNPUB RES