HALL-COEFFICIENT IN VACUUM-DEPOSITED COPPER FILMS

被引:9
作者
KINBARA, A
UEKI, K
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D O I
10.1016/0040-6090(72)90394-X
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:63 / &
相关论文
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[3]  
MURGULESCU IG, 1967, 2 P COLL THIN FILMS, P466
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[5]   A theory of the irreversible electrical resistance changes of metallic films evaporated in vacuum [J].
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