COMPUTER-GENERATED HOLOGRAM ETCHED IN GAAS FOR OPTICAL INTERCONNECTION OF VLSI CIRCUITS

By integrating, on a wafer plane, GaAs semiconductor optoelectronic modulators and detectors with computer-generated holograms between then, the potential for in-plane interconnections is proposed. We report the fabrication and characterisation of a binary-phase relief hologram etched in a GaAs wafer using an averaged Fresnel zone plate design to focus light to 2 x 2 spots for array interconnection. Efficiencies of 28% for this design of binary CGH etched in GaAs have been achieved, close to the theoretical maximum.