ISFETS USING INORGANIC GATE THIN-FILMS

被引:165
作者
ABE, H
ESASHI, M
MATSUO, T
机构
[1] Department of Electronic Engineering, Tohoku University, Sendai
关键词
D O I
10.1109/T-ED.1979.19799
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The characteristics of various types of ISFET's using inorganic gate films are described. The pH and pNa selectivities are investigated for SiO2, Si3N4, A12O3, alumino-silicate, and sodiumalumino-silicate gate dielectrics. The transient response and device stability are also studied for different values of solution pH. The Al2O3 gate shows a nearly ideal pH response, excellent stability, and selectivity to other cations. On the other hand, the Si3N4 gate is also a good pH sensor, but it is proved by the studies of SiO2 and SiOxNy films that the oxygen content in its surface degrades its properties as a pH sensor. Sodium-alumino-silicate, which is generally known as a material for pNa selective glass electrodes, is utilized as a gate film for the pNa ISFET. The pNa selectivity of this device is comparable to that of the conventional glass electrode. The alumino-silicate gate has also a pNa selectivity, but iti s inferior to the sodium-alumino-silicate gate. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
引用
收藏
页码:1939 / 1944
页数:6
相关论文
共 14 条