TOTAL REFLECTION X-RAY-FLUORESCENCE OF SINGLE AND MULTIPLE THIN-LAYER SAMPLES

被引:50
作者
DEBOER, DKG [1 ]
VANDENHOOGENHOF, WW [1 ]
机构
[1] PHILIPS ANALYT,7602 EA ALMELO,NETHERLANDS
关键词
D O I
10.1016/0584-8547(91)80181-2
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
In Total-reflection X-Ray Fluorescence (TXRF) the penetration depth of the exciting X-rays can be varied between a few nanometers and a few micrometers. In this paper the extension of the application of this technique to thin-film analysis is studied. First a theory is described with which the angular dependence of TXRF intensities can be calculated. Next calculated data are shown for various thin-film samples. The theoretical results compare favourably with preliminary experiments performed with a modified diffractrometer equipped with an energy-dispersive X-ray detector. The conclusion is that TXRF, especially when combined with X-ray reflectivity measurements, is a promising technique to obtain information about quantity and distribution of material over the various layers. The expected detection limits for this case are of the order of 10(13) atoms cm-2.
引用
收藏
页码:1323 / 1331
页数:9
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