KINETICS OF OXIDE FILM GROWTH ON METAL CRYSTALS .2. HOMOGENEOUS FIELD APPROXIMATIONS

被引：43

作者：

FROMHOLD, AT

机构：

来源：

关键词：

D O I：

10.1016/0022-3697(63)90176-8

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1309 / &

共 45 条

[1] BARDEEN J, 1946, J CHEM PHYS, V14, P717
[2] BENARD J, 1948, CR HEBD ACAD SCI, V225, P411
[3] CABRERA N, 1948, REP PROGR PHYS, V12, P170
[4] THE OXIDATION CHARACTERISTICS OF THE ALKALI METALS .1. THE OXIDATIONRATE OF SODIUM BETWEEN-79-DEGREES-C AND 48-DEGREES-C
CATHCART, JV
HALL, LL
SMITH, GP
[J]. ACTA METALLURGICA, 1957, 5 (05): : 245 - 248
[5] ELEY DD, 1960, P ROY SOC A, V254, P340
[6] TUNNELING THROUGH THIN INSULATING LAYERS
FISHER, JC
GIAEVER, I
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) : 172 - &
[7] KINETICS OF OXIDE FILM GROWTH ON METAL CRYSTALS .1. FORMULATION AND NUMERICAL SOLUTIONS
FROMHOLD, AT
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1963, 24 (09) : 1081 - +
[8] SPACE-CHARGE-LIMITED TUNNEL EMISSION INTO AN INSULATING FILM
GEPPERT, DV
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2993 - &
[9] THE GAS/OXIDE INTERFACE AND THE OXIDATION OF METALS
GRIMLEY, TB
TRAPNELL, BMW
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1956, 234 (1198): : 405 - 418
[10] GRIMLEY TB, OXIDATION METALS CHE, P350