OPEN-AIR PHOTORESIST ASHING BY A COLD-PLASMA TORCH - CATALYTIC EFFECT OF CATHODE MATERIAL

被引：33

作者：

INOMATA, K

KOINUMA, H

OIKAWA, Y

SHIRAISHI, T

机构：

[1] TOKYO INST TECHNOL,ENGN MAT RES LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN

[2] TOKAI UNIV,FAC ENGN,HIRATSUKA,KANAGAWA 25912,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 17期

关键词：

D O I：

10.1063/1.113942

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A beam plasma was generated and exhausted into air by applying rf voltage to the atmospheric pressure argon flowing through a cylindrical gap between a needle cathode and a grounded cylindrical anode whose surface was covered with an insulator. This torch-type plasma with gas and electron temperatures of 240°C (44.2 meV) and 1.0 eV, respectively, has been verified to be useful for ashing a photoresist without using a pumping system. High rate (≥1.2 μm/min) photoresist ashing was achieved by using Ar plasma containing a small amount of oxygen. Also reported are optical emission analysis of plasma and analyses of ashed Si surface by scanning electron microscopy. Fourier transform infrared spectroscopy, electron microprobe analysis, and x-ray photoelectron spectroscopy. The use of the Pt cathode was found to provide not only a better ashed surface but also a higher ashing rate than the use of the stainless-steel cathode.© 1995 American Institute of Physics.

引用

页码：2188 / 2190

页数：3

共 8 条

[1]

Walkup R.E., Saenger K.L., Selwyn G.S., J. Chem. Phys., 84, (1986)

[2]

Degenkolb E.O., Mogab C.J., Goldrick M.R., Griffiths J.E., Appl. Spectrosc., 30, (1976)

[3]

Koinuma H., Inomata K., Ohkubo H., Hashimoto T., Shiraishi T., Miyanaga A., Hayashi S., Appl. Phys. Lett., 60, (1992)

[4]

Inomata K., Ha H., Chaudhary K.A., Koinuma H., Appl. Phys. Lett., 64, (1994)

[5]

Inomata K., Aoki N., Koinuma H., Jpn. J. Appl. Phys., 33, (1994)

[6]

Walkup R.E., Saenger K.L., Selwyn G.S., J. Chem. Phys., 84, (1986)

[7]

Dengenkolb E.O., Mogap C.J., Goldrick M.R., Griffiths J.E., Appl. Spectrosc., 30, (1976)

[8]

Inomata K., Koinuma H., Proceedings of the 2nd International Conference on Reactive Plasmas and the 11th Symposium on Plasma Processing, 143, (1994)

← 1 →