OPEN-AIR PHOTORESIST ASHING BY A COLD-PLASMA TORCH - CATALYTIC EFFECT OF CATHODE MATERIAL

被引:33
作者
INOMATA, K
KOINUMA, H
OIKAWA, Y
SHIRAISHI, T
机构
[1] TOKYO INST TECHNOL,ENGN MAT RES LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN
[2] TOKAI UNIV,FAC ENGN,HIRATSUKA,KANAGAWA 25912,JAPAN
关键词
D O I
10.1063/1.113942
中图分类号
O59 [应用物理学];
学科分类号
摘要
A beam plasma was generated and exhausted into air by applying rf voltage to the atmospheric pressure argon flowing through a cylindrical gap between a needle cathode and a grounded cylindrical anode whose surface was covered with an insulator. This torch-type plasma with gas and electron temperatures of 240°C (44.2 meV) and 1.0 eV, respectively, has been verified to be useful for ashing a photoresist without using a pumping system. High rate (≥1.2 μm/min) photoresist ashing was achieved by using Ar plasma containing a small amount of oxygen. Also reported are optical emission analysis of plasma and analyses of ashed Si surface by scanning electron microscopy. Fourier transform infrared spectroscopy, electron microprobe analysis, and x-ray photoelectron spectroscopy. The use of the Pt cathode was found to provide not only a better ashed surface but also a higher ashing rate than the use of the stainless-steel cathode.© 1995 American Institute of Physics.
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页码:2188 / 2190
页数:3
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