CURIE-TEMPERATURE OF ULTRATHIN FILMS OF FCC COBALT EPITAXIALLY GROWN ON ATOMICALLY FLAT CU(100) SURFACES

被引：458

作者：

SCHNEIDER, CM ^{[1
]}

BRESSLER, P ^{[1
]}

SCHUSTER, P ^{[1
]}

KIRSCHNER, J ^{[1
]}

DEMIGUEL, JJ ^{[1
]}

MIRANDA, R ^{[1
]}

机构：

[1] UNIV AUTONOMA MADRID,DEPT FIS MAT CONDENSADA,E-28049 MADRID,SPAIN

来源：

PHYSICAL REVIEW LETTERS | 1990年 / 64卷 / 09期

关键词：

D O I：

10.1103/PhysRevLett.64.1059

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We have explored the relationship between epitaxial growth and magnetism in the case of ultrathin fcc-Co films by means of a multitechnique approach. For high-quality fcc-Co films less than 3 monolayers thick the Curie temperatures TC are dramatically lower than TCB of bulk fcc-Co and decease distinctly with film thickness. In contrast to previous claims, TC of a single monolayer appears to be far below 300 K. Substrate topology is found to strongly influence the structural perfection of the films which in turn determines their magnetic properties (Curie temperature, coercive field, and anisotropies). © 1990 The American Physical Society.

引用

页码：1059 / 1062

页数：4

共 6 条

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