EQUILIBRIUM, DIFFUSION AND IMPERFECTIONS IN SEMICONDUCTORS

被引：7

作者：

HOBSTETTER, JN

机构：

来源：

PROGRESS IN METAL PHYSICS | 1958年 / 7卷

关键词：

D O I：

10.1016/0502-8205(58)90003-0

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：1 / 63

页数：63

共 94 条

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