IMPROVEMENT OF ALIGNMENT ACCURACY OF AN SR STEPPER

被引：4

作者：

FUKUDA, M

SUZUKI, M

SHIBAYAMA, A

机构：

[1] NTT LSI Laboratories 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa

来源：

MICROELECTRONIC ENGINEERING | 1994年 / 23卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)90134-1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In order to improve the alignment accuracy in optical heterodyne detection used in an advanced SR stepper, the SS-I, it is essential to reduce crosstalk as well as multiple reflection. This paper discusses the effects of crosstalk on an alignment by analyzing the interaction between mask and wafer mark signals in optical heterodyne systems. An alignment accuracy within 40 nm (3 sigma) is obtained by reducing crosstalk up to 2%.

引用

页码：189 / 192

页数：4

共 3 条

[1]

Ishihara, Suzuki, Kanai, Fukuda, An Advanced X-ray Stepper for 1/5 μm SR Lithography, ME., 17, (1992)

[2]

Deguchi, Miyoshi, Ban, Kyuragi, Matsuda, Matsuda, Application of x-ray lithography with a single-layer resist process to subquartermicron large scale integrated circuit fabrication, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 10, 6, (1992)

[3]

Koga, Higashikawa, Itoh, Evaluation of heterodyne alignment technique for x-ray steppers, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 10, 6, (1992)

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