THE METASTABLE C49 STRUCTURE IN SPUTTERED TISI2 THIN-FILMS

被引：10

作者：

BRETSCHNEIDER, W ^{[1
]}

BEDDIES, G ^{[1
]}

SCHOLZ, R ^{[1
]}

机构：

[1] ACAD SCI GDR,INST SOLID STATE PHYS & ELECTRON MICROSCOPY,WEINBERG 2,DDR-4050 HALLE,GER DEM REP

来源：

THIN SOLID FILMS | 1988年 / 158卷 / 02期

关键词：

D O I：

10.1016/0040-6090(88)90028-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：255 / 263

页数：9

共 10 条

[1] METASTABLE PHASE FORMATION IN TITANIUM-SILICON THIN-FILMS [J].

BEYERS, R ;

SINCLAIR, R .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) :5240-5245

[2]

DHEURLE PM, 1985, IBM RC11151 RES REP

[3]

HIRSCH PB, 1965, ELECTRON MICROSCOPY

[4]

MAHL H, 1961, Z NATURFORSCH, V15, P1051

[5] NUCLEATION AND GROWTH OF TITANIUM SILICIDE STUDIED BY INSITU ANNEALING IN A TRANSMISSION ELECTRON-MICROSCOPE [J].

RAAIJMAKERS, IJMM ;

READER, AH ;

VANHOUTUM, HJW .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (07) :2527-2532

[6]

Schubert K, 1964, KRISTALLSTRUKTUREN Z

[7]

VANHOUTUM HJW, 1986, THIN FILMS INTERFACE, V54, P37

[8] SMALL ANGLE ELECTRON SCATTERING FROM VACUUM CONDENSED METALLIC FILMS [J].

WADE, RH ;

SILCOX, J .

PHYSICA STATUS SOLIDI, 1967, 19 (01) :57-&

[9]

[No title captured]

[10]

23964 INT CTR DIFFR

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