A TRANSMISSION-ELECTRON-MICROSCOPY STUDY OF NICKEL FILMS ELECTRODEPOSITED ON A COPPER SUBSTRATE

被引：37

作者：

IVES, AG

EDINGTON, JW

ROTHWELL, GP

机构：

来源：

关键词：

D O I：

10.1016/0013-4686(70)90062-9

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1797 / &

共 10 条

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[2] HIRSCH JB, 1967, ELECTRON MICROSCOPY, P229
[3] HOAR TP, 1962, T I METAL FINISH, V39, P166
[4] JONES MH, 1966, PLATING, V53, P995
[5] LAWLESS KR, 1960, 2 P EUR REG C EL MIC, P396
[6] LAWLESS KR, 1961, NEDERLANDSE VERENIGN
[7] MAURIN G, 1966, METAUX, V41, P102
[8] Pourbaix M., 1966, ATLAS ELECTROCHEMICA, P333
[9] ELASTIC STRAIN IN THIN EPITAXIAL ELECTRODEPOSITS OF GOLD AND NICKEL ON COPPER
THOMPSON, ER
LAWLESS, KR
[J]. ELECTROCHIMICA ACTA, 1969, 14 (03) : 269 - &
[10] OBSERVATION OF INTERFACIAL DISLOCATIONS IN THIN (100) AND (111) ELECTRODEPOSITS OF NICKEL ON COPPER
THOMPSON, ER
LAWLESS, KR
[J]. APPLIED PHYSICS LETTERS, 1966, 9 (04) : 138 - &