ACIDITY OF LITHOGRAPHIC MATERIALS - CHARACTERIZATION BY COLORIMETRIC TITRATION

被引：5

作者：

PANIEZ, PJ

DEMATTEI, DC

ABADIE, MJM

机构：

[1] CNET-CNS, 38243 MEYLAN CEDEX

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(92)90056-W

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The acidic character of various lithographic materials, namely novolaks, Polyhydroxystyrene and Diazonaphtoquinone photoactive compounds, is investigated using colorimetric titration. The acidity of polymers is studied as a function of the isomer structure, chain length and synthesis conditions. The comparison of the acidic properties of these materials provides useful information on the role of chemical mechanisms in both wet and dry development processes.

引用

页码：279 / 282

页数：4

共 11 条

[1]

Pacansky, Johnson, Photochemical Studies on a Substituted Naphthalene-2,1,Diazooxide, Journal of The Electrochemical Society, 124, (1977)

[2]

Templeton, Szmanda, Zampini, SPIE 87 Proc., 771, (1987)

[3]

Hanrahan, Hollis, SPIE 87 Proc., 771, (1987)

[4]

Pampalone, Kuyan, J. Electrochem. Soc., 135, (1988)

[5]

Spencer, Grunwald, Cordes, Moffatt, Latchford, Ma, Chen, <title>Characterization Of Conditions Required To Implement Submicron Processes Over Topography Using Dry Develop Method(S)</title>, SPIE 88 Proc., 920, (1988)

[6]

Ito, Wilson, Polym. Eng. Sci., 23, (1983)

[7]

MacKean, Schaedeli, MacDonald, Acid photogeneration from sulfonium salts in solid polymer matrices, Journal of Polymer Science Part A: Polymer Chemistry, 27, (1989)

[8]

Knop, Pilato, Phenolic Resins, (1985)

[9]

Casiraghi, Casnati, Cornia, Sartori, Bigi, Die Makromolekulare Chemie, 182, (1981)

[10]

Vollenbroek, Mutsaers, Nijssen, Polym. Mat. Sci. Eng., 61, (1989)

← 1 2 →