AN ELLIPSOMETRIC STUDY OF THE RF SPUTTER OXIDATION OF LEAD-INDIUM ALLOYS

被引：10

作者：

DONALDSON, GB ^{[1
]}

FAGHIHINEJAD, H ^{[1
]}

机构：

[1] UNIV LANCASTER, DEPT PHYS, LANCASTER LA1 4YQ, LANCASHIRE, ENGLAND

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1980年 / 27卷 / 10期

关键词：

D O I：

10.1109/T-ED.1980.20136

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1988 / 1997

页数：10

共 19 条

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[8]

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[9]

DONALDSON GB, 1978, FUTURE TRENDS SUPERC, P407

[10] ROOM-TEMPERATURE OXIDATION OF LEAD-INDIUM ALLOY-FILMS [J].

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