EXPERIMENTAL INVESTIGATION OF THE RESIST HEATING EFFECT IN A VARIABLY SHAPED EBL SYSTEM

被引：2

作者：

BABIN, SV

KOSTIC, I

HUDEK, P

机构：

[1] Physics and Technology Institute Krasikova, 117218 Moscow

[2] Institute of Computer Systems, CS 842 37 Bratislava

来源：

MICROELECTRONIC ENGINEERING | 1993年 / 21卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(93)90050-F

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Quantitative investigations of the influence of electron beam shot size on resist heating and the corresponding sensitivity change were performed for a variably shaped electron beam lithography system. The possible influence of other factors was taken into account to separate the resist heating effect. Measurements were performed for a number of beam current densities. It was shown, that the multiple exposure with a delay applied between the successive shots allows to eliminate the effect caused by the heating of the resist.

引用

页码：173 / 176

页数：4

共 8 条

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